Announcement of an Exempt Purchase

Heidelberg Instruments that allows a mask-less lithography technique and the ability to bypass the long process of ordering a photo-mask and enables us to transfer the design directly to the wafer without the need for a photo-mask.

This purchase is exempt from the usual selection processes of the Procurement Code because the procurement expenditure is for performing sponsored research and other sponsored activities under grants and contracts funded by the sponsor or by sources other than State appropriations. (30 ILCS 500 / 1-13(b)(8)) Next generation lithography, i.e. maskless direct-write lithography, will enable the training of new generation of scientists and engineers, as defined by the mission of the University, and the CHIPS Act. By upgrading to the new tool, we are able to transition to new type of lithography technology at the same price as replacing the obsolete tool with a new traditional lithography-based mask aligner. Heidelberg Instruments is the leader in mask-less lithography equipment, and most major nanolabs are transitioning to this tool.