This instrument is needed to meet the semiconductor processing needs of the College of Engineering. This is a direct write laser system that creates patterned 1.0 micron and sub-micron (down to 0.3) size structures on semiconductor wafers or it can be used to crate photomasks for photolithography on other instrumentation, such as blanket UV exposure systems.

This purchase is exempt from the usual selection processes of the Procurement Code because the procurement expenditure is for performing sponsored research and other sponsored activities under grants and contracts funded by the sponsor or by sources other than State appropriations. (30 ILCS 500 / 1-13(b)(8)) The purchase of equipment with the same capability would have cost more than $500,000.00. At a minimum, the University would have to spend an additional $375,000.00 in the acquisition of new equipment with the same specifications. The ability to create photomasks also reduces the long-term expenses of operating the laboratory.